X-ray exposure in the manufacture of sub-150-nm gate lines

X-ray exposure in the manufacture of sub-150-nm gate lines

Author(s):

Lamberti,A.C. ( IBM Thomas J.Research Ctr. )

Publication title:

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2723

Pub. Year:

1996

Page(from):

237

Page(to):

248

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819420992 [0819420999]

Language:

English

Call no.:

P63600/2723

Type:

Conference Proceedings

Details

TDL ID:	ZA00018868
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing
Conf. info. (Number):	1996 : 6th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1996.03.11-1996.06.13

Similar Items:

1 Conference Proceedings Alternating phase-shifted mask for logic gate levels,design,and mask manufacturing Liebmann,L.W., Graur,I.C., Leipold,W.C., Oberschmidt,J.M., O'Grady,D.S., Regaill,D. SPIE - The International Society for Optical Engineering	7 Conference Proceedings Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination Petersen, J.S., Conley, W., Roman, B.J., Litt, L.C., Lucas, K., Wu, W., Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., … SPIE-The International Society for Optical Engineering
2 Conference Proceedings High performance SOI technology for sub-45nm gate length CMOS manufacturing Invited Horstmann, M., Greenlaw, D., Huebler, P., Stephan, R., Feudel, Th., Wei, A., Frohberg, K., Hoentschel, J., Javorka, P., … Electrochemical Society	8 Conference Proceedings Resist materials for 157-nm microlithography: an update Willson,C.G., Tran,H.V., Trinque,B.C., Chiba,T., Yamada,S., Sanders,D.P., Connor,E.F., Grubbs,R.H., Klopp,J.M., … SPIE-The International Society for Optical Engineering
3 Conference Proceedings Preparation of Pd/C catalysts: from the Pd-precursor solution to the final systems F. Rotunno, C. Prestipino, S. Bertarione, E. Gruppo, D. Scarano, A. Zecchina, R. Pellegrini, G. Leofanti, C. Lamberti Elsevier	9 Conference Proceedings Complementary double-exposure technique (CODE): a way to print 80-nm gate level using a double-exposure binary mask approach Manakli, S., Trouiller. Y., Toublan, O., Schiavone, P., Miramond, C., Rody, Y.F., Sundermann, F., Chapon, J.D., Goirand, … SPIE-The International Society for Optical Engineering
4 Conference Proceedings Applications of CPL mask technology for sub-65nm gate imaging Litt, L. C., Conley, W., Wu, W., Peters, R., Parker, C., Cobb, J., Kasprowicz, B. S., van den Broeke, D., Park, J. C., … SPIE - The International Society of Optical Engineering	10 Conference Proceedings Sub-100-nm and deep sub-100-nm MOS transistor gate patterning Xiang,Q., Gupta,S., Spence,C.A., Singh,B., Yeap,G.C.-F., Lin,M.-R. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Application of Cr-less mask technology for sub-100-nm gate with single exposure Kim, S.-H., Chung, D.-H., Park, J.S.., Shin, I.K., Choi, S.W., Sohn, J.-M., Lee, J.-H., Shin, H.-S., Chen, J.F., Van Den … SPIE-The International Society for Optical Engineering	11 Conference Proceedings Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography Fritze,M., Tyrrell,B., Astolfi,D.K., Davis,P., Wheeler,B., Mallen,R., Jarmolowicz,J., Cann,S.G., Chan,D.Y., Rhyins,P.D., … SPIE-The International Society for Optical Engineering
6 Conference Proceedings High Density Plasma Gate Etching of 0.12 um Devices with Sub-1.5 nm Gate Oxides Klemens, F.P., Baumann, F.H., Kornblit, A., Layadi, N., Lee, H., Maynard, H.L., Mytych, J.M., Sorch, T.W., Tennant, … Electrochemical Society	12 Conference Proceedings 193-nm single-layer process for 150-nm technology generation and below Amblard, G. R., Zandbergen, P., McCallum, M., Stephen, A., Byers, J. D., Dean, K. R., Meute, J., Nelson, C. M. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12