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Application of SR lithography to 0.14-ｦﾌm device fabrication

Author(s):
Sumitani,H. ( Mitsubishi Electric Corp. )
Itoga,K.
Shimano,H.
Aya,S.
Yabe,H.
Hifumi,T.
Watanabe,H.
Kise,K.
Inoue,M.
Marumoto,K.
Nishioka,Y.
Abe,H.
Mizusawa,N.
Saitoh,K.
Uzawa,S.
10 more
Publication title:
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2723
Pub. Year:
1996
Page(from):
222
Page(to):
236
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819420992 [0819420999]
Language:
English
Call no.:
P63600/2723
Type:
Conference Proceedings

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