X-ray mask image-placement studies at the Microlithography Mask Development Center
- Author(s):
Puisto,D. ( Loral Federal Systems ) Lawliss,M. Faure,T. rocque,J.M. Kimmel,K.R. Benoit,D.E. - Publication title:
- Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2723
- Pub. Year:
- 1996
- Page(from):
- 204
- Page(to):
- 210
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819420992 [0819420999]
- Language:
- English
- Call no.:
- P63600/2723
- Type:
- Conference Proceedings
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