Excimer laser-induced heating,melting,and mass diffusion in crystal silicon in nanosecond and nanometer scale

Excimer laser-induced heating,melting,and mass diffusion in crystal silicon in nanosecond and nanometer scale

Author(s):

Zhang,X. ( Univ.of California/Berkeley )
Ho,J.R.
Grigoropoulos,C.P.

Publication title:

Lasers as tools for manufacturing of durable goods and microelectronics : 19 January-2 February, 1996, San Jose, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2703

Pub. Year:

1996

Vol.:

PartA

Page(from):

232

Page(to):

241

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819420770 [0819420778]

Language:

English

Call no.:

P63600/2703

Type:

Conference Proceedings

Details

TDL ID:	ZA00018866
Series ID:	PA00000029
Conf. info. (Name):	Photonics West : Lasers as Tools for Manufacturing of Durable Goods and Microelectronics
Conf. info. (Number):	1996
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	1996.01.29-1996.02.02

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