Elimination of bottom-pinching effect in environmentally stable chemically amplified resists
- Author(s):
- Soo,C.P. ( National Univ.of Singapore )
- Fan,M.H. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
- Bourdillon,A.J. ( National Univ.of Singapore )
- Chan,L.H. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
- Publication title:
- Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3332
- Pub. Year:
- 1998
- Page(from):
- 727
- Page(to):
- 734
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427779 [0819427772]
- Language:
- English
- Call no.:
- P63600/3332
- Type:
- Conference Proceedings
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