Characterization of a positive chemically amplified photoresist for process control
- Author(s):
Jakatdar,N.H. ( Univ.of California/Berkeley ) Niu,X. ( Univ.of California/Berkeley ) Spanos,C.J. ( Univ.of California/Berkeley ) Romano,A.R. ( National Semiconductor Corp. ) Bendik,J.J. ( National Semiconductor Corp. ) Kovacs,R.P. ( National Semiconductor Corp. ) Hill,S.L. ( Bio-Rad ) - Publication title:
- Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3332
- Pub. Year:
- 1998
- Page(from):
- 586
- Page(to):
- 593
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427779 [0819427772]
- Language:
- English
- Call no.:
- P63600/3332
- Type:
- Conference Proceedings
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