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Characterization of a positive chemically amplified photoresist for process control

Author(s):
Jakatdar,N.H. ( Univ.of California/Berkeley )
Niu,X. ( Univ.of California/Berkeley )
Spanos,C.J. ( Univ.of California/Berkeley )
Romano,A.R. ( National Semiconductor Corp. )
Bendik,J.J. ( National Semiconductor Corp. )
Kovacs,R.P. ( National Semiconductor Corp. )
Hill,S.L. ( Bio-Rad )
2 more
Publication title:
Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3332
Pub. Year:
1998
Page(from):
586
Page(to):
593
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427779 [0819427772]
Language:
English
Call no.:
P63600/3332
Type:
Conference Proceedings

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