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Precision improvement for the calibration of submicron dimension reference for electron-beam metrology system

Author(s):
  • O,B. ( Inha Univ.(Korea) )
  • Park,B.C. ( Korea Research Institute of Standards and Science )
  • Ko,Y.-U. ( Korea Research Institute of Standards and Science )
Publication title:
Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3332
Pub. Year:
1998
Page(from):
560
Page(to):
567
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427779 [0819427772]
Language:
English
Call no.:
P63600/3332
Type:
Conference Proceedings

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