Fast-etch antireflective coating for sub-0.35-ヲフm i-line microlithography applications
- Author(s):
- Williams,P. ( Brewer Science Ltd. (UK) )
- Shao,X. ( Brewer Science Inc. )
- Lamb,J.E. ( Brewer Science Inc. )
- Hester,C. ( Brewer Science Inc. )
- Flaim,T. ( Brewer Science Inc. )
- Publication title:
- Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3332
- Pub. Year:
- 1998
- Page(from):
- 518
- Page(to):
- 525
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427779 [0819427772]
- Language:
- English
- Call no.:
- P63600/3332
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Critical dimension control for i-line 0.35-ヲフm device using a new antireflective coating
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Lithographic performance at 0.3-to 0.35-ヲフm patterns by using i-line stepper with off-axis illumination technology
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Implementation of organic bottom antireflective coating in 0.35-ヲフm polycide fabrication
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Sub-0.35-μm i-line lithography with new advanced bottom antireflective coatings optimized for high-topography and dual-damascene applications
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
0.35-ヲフm i-line attenuated phase-shift mask(PSM)repair by focused-ion-beam technology
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Phase shifting and optical proximity corrections to improve CD control on logic devices in manufacturing for sub-0.35-ヲフm i-line
SPIE-The International Society for Optical Engineering |
American Chemical Society |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Optimization of PVD Ti/CVD TiN Liner for 0.35 ヲフm Tungsten Plug Technology
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |