Developing a method to determine linewidth based on counting the atom spacings across a line

Author(s):

Silver,R.M. ( National Institute of Standards and Technology )

Jensen,C.P. ( Danish Institute of Fundamental Metrology )

Tsai,V.W. ( National Institute of Standards and Technology )

Fu,J. ( National Institute of Standards and Technology )

Villarrubia,J.S. ( National Institute of Standards and Technology )

Teague,E.C. ( National Institute of Standards and Technology )

1 more

Publication title:

Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3332

Pub. Year:

1998

Page(from):

441

Page(to):

460

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427779 [0819427772]

Language:

English

Call no.:

P63600/3332

Type:

Conference Proceedings