Ellipsometric scatterometry for sub-0.1-ｦﾌm CD measurements

Ellipsometric scatterometry for sub-0.1-ｦﾌm CD measurements

Author(s):

Coulombe,S.A. ( Univ.of New Mexico )
Logofatu,P.C. ( Univ.of New Mexico )
Minhas,B.K. ( Massachusetts Institute of Technology )
Naqvi,S.S.H. ( GIK Institute of Engineering Science and Technology (Pakistan) )
McNeil,J.R. ( Univ.of New Mexico )

Publication title:

Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3332

Pub. Year:

1998

Page(from):

282

Page(to):

293

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427779 [0819427772]

Language:

English

Call no.:

P63600/3332

Type:

Conference Proceedings

Details

TDL ID:	ZA00018777
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology,Inspection, and Process Control for Microlithograph
Conf. info. (Number):	1998 : 12th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1998.02.23-1998.02.25

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