SPC tracking and run monitoring of a CD SEM

SPC tracking and run monitoring of a CD SEM

Author(s):

Allgair,J. ( Motorola )
Ruehle,D.G. ( Motorola )
Elliott,R.C. ( KLA-Tencor Corp. )
Herrera,P.P. ( KLA-Tencor Corp. )
Miller,J. ( KLA-Tencor Corp. )

Publication title:

Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3332

Pub. Year:

1998

Page(from):

243

Page(to):

251

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427779 [0819427772]

Language:

English

Call no.:

P63600/3332

Type:

Conference Proceedings

Details

TDL ID:	ZA00018777
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology,Inspection, and Process Control for Microlithograph
Conf. info. (Number):	1998 : 12th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1998.02.23-1998.02.25

Similar Items:

1 Conference Proceedings Alternative method for monitoring an in-line CD SEM Herrera,P.P., Dick,S.A., Allgair,J. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Initial characterization results of a low-voltage CD SEM for reticle metrology Quattrini,R., MacNaughton,C.W., Elliott,R.C., Ng,W., Malhotra,R., Ananth,M., Yee,J.C. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Feature integrity monitoring for process control using a CD SEM Allgair,J., Chen,G., Marples,S.J., Goodstein,D.M., Miller,J.D., Santos,F. SPIE - The International Society for Optical Engineering	8 Conference Proceedings Determination of optimal parameters for CD-SEM measurement of line-edge roughness Bunday, B.D., Bishop, M., McCormack, D.W., Jr., Villarrubia, J.S., Vladar, A.E., Dixson, R., Vorburger, T.V., Orji, … SPIE - The International Society of Optical Engineering
3 Conference Proceedings Implementation of spectroscopic critical dimension (SCD) (TM) for gate CD control and stepper characterization Allgair,J.A., Benoit,D.C., Drew,M., Hershey,R.R., Litt,L.C., Herrera,P.P., Whitney,U.K., Guevremont,M., Levy,A., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Characterization of optical proximity correction features Allgair,J.A., Ivy,M., Lucas,K., Sturtevant,J.L., Elliott,R.C., Mack,C.A., MacNaughton,C.W., Miller,J.D., Pochkowski,M., … SPIE-The International Society for Optical Engineering
4 Conference Proceedings Statistical verification of multiple CD-SEM matching Erickson,D., Sullivan,N.T., Elliott,R.C. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Results of benchmarking of advanced CD-SEMs at the 90-nm CMOS technology node Bunday, B.D., Bishop, M., Allgair, J.A. SPIE - The International Society of Optical Engineering
5 Conference Proceedings The coming of age of tilt CD-SEM B. Bunday, J. Allgair, E. Solecky, C. Archie, N. G. Orji, J. Beach, O. Adan, R. Peltinov, M. Bar-zvi, J. Swyers SPIE - The International Society of Optical Engineering	11 Conference Proceedings Major trends in extending CD-SEM utility B. Bunday, J. Allgair, K. Yang, S. Koshihara, H. Morokuma, A. Danilevsky, C. Parker, L. Page SPIE - The International Society of Optical Engineering
6 Conference Proceedings Benchmarking multimode CD-SEM metrology to 180 nm Monahan,K.M., Askary,F., Elliott,R.C., Forcier,R.A., Quattrini,R., Sheumaker,B.L., Yee,J.C., Marchman,H.M., … SPIE-The International Society for Optical Engineering	12 Conference Proceedings New apparent beam width artifact and measurement methodology for CD-SEM resolution monitoring Mayer, J.A., Huizenga, K.J., Solecky, E.P., Archie, C.N., Banke, G.W. Jr.,, Cogley, R.M., Nathan, C., Robert, J.M. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12