Defect inspection and linewidth measurement of SCALPEL thin membrane masks using optical transmission
- Author(s):
Farrow,R.C. ( Lucent Technologies/Bell Labs. ) Blakey,M.I. ( Lucent Technologies/Bell Labs. ) Kasica,R.J. ( Lucent Technologies/Bell Labs. ) Liddle,J.A. ( Lucent Technologies/Bell Labs. ) Mkrtchyan,M.M. ( Lucent Technologies/Bell Labs. ) Novembre,A.E. ( Lucent Technologies/Bell Labs. ) Peabody,M.L. ( Lucent Technologies/Bell Labs. ) Saunders,T.E. ( Lucent Technologies/Bell Labs. ) Windt,D.L. ( Lucent Technologies/Bell Labs. ) Zurbrick,L.S. ( KLA-Tencor Corp. ) Wiley,J.N. ( KLA-Tencor Corp. ) Aquino,C. ( KLA-Tencor Corp. ) Hentschel,S.L. ( KLA-Tencor Corp. ) Davis,L.C. ( Photronics ) Boyer,B. ( DuPont Photomasks Inc. ) - Publication title:
- Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3332
- Pub. Year:
- 1998
- Page(from):
- 221
- Page(to):
- 231
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427779 [0819427772]
- Language:
- English
- Call no.:
- P63600/3332
- Type:
- Conference Proceedings
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