Limitation of CD AFM on resist foot detection

Limitation of CD AFM on resist foot detection

Author(s):

Su,B. ( Applied Materials,Inc. )
Rajkumar,K.C. ( National Semiconductor Corp. )
Agrawal,M. ( National Semiconductor Corp. )

Publication title:

Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3332

Pub. Year:

1998

Page(from):

151

Page(to):

162

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427779 [0819427772]

Language:

English

Call no.:

P63600/3332

Type:

Conference Proceedings

Details

TDL ID:	ZA00018777
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology,Inspection, and Process Control for Microlithograph
Conf. info. (Number):	1998 : 12th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1998.02.23-1998.02.25

Similar Items:

1 Conference Proceedings Improved resist profiles and CD control through optimized thin dielectric stacks C.F. Lyons, M. Agrawal, B. Singh Society of Photo-optical Instrumentation Engineers	7 Conference Proceedings Effect of various ArF resist shrinkage amplitudes on CD bias Ke, C.-M., Gau, T.-S., Chen, P.-H., Yen, A., Lin, B.J., Otaka, T., Iizumi, T., Sasada, K., Ueda, K. SPIE-The International Society for Optical Engineering
2 Conference Proceedings REFLECTION ELECTRON DIFFRACTION AND STRUCTURAL BEHAVIOR OF GaAs/GaAs(111)B GROWN VIA MBE Rajkumar, K.C., Chen, P., Madhukar, A. Materials Research Society	8 Conference Proceedings Comprehensive analysis of sources of total CD variation in ArF resist perspective Kim, H.-W., Lee, H.-R., Kim, K.-M., Lee, S.Y., Kim, B.-C., Oh, S.-H., Woo, S.-G., Cho, H.-K., Han, W.-S. SPIE - The International Society of Optical Engineering
3 Conference Proceedings REFLECTION ELECTRON DIFFRACTION AND STRUCTURAL BEHAVIOR OF GaAs/GaAs (111)B GROWN VIA MBE Rajkumar, K.C., Chen, P., Madhukar A. Materials Research Society	9 Conference Proceedings TEM validation of CD AFM image reconstruction: part II G. A. Dahlen, H.-C. Liu, M. Osborn, J. R. Osborne, B. Tracy Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Compensation of resist trim process and polygate plasma microloading effect for lithography process window and CD uniformity improvement Lee, K.M., Fan, C.W., Hwang, J.R., Liu, C.C., Hung, K.C. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Growth and properties of semiconductor bolometers for infrared detection M.H. Unewisse, B.I. Craig, R.J. Watson, O. Reinhold, K.C. Liddiard Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Effect of setpoint on CD measurement in CD- AFM: plausibility study B. C. Park, J. Choi, S. J. Ahn, M. Shin, D. Ihm Society of Photo-optical Instrumentation Engineers	11 Conference Proceedings Using Magnetic Nanoparticles to Enhance Gene Transfection on Magneto-Electroporation Microchips Li, M., Lin, Y.C., Su, K.C. Trans Tech Publications
6 Conference Proceedings INITIAL STAGES OF MOLECULAR BEAM EPITAXICAL GROWTH OF HIGHLY STRAINED InXGa1-XAs ON GaAs (100) Guha, S., Madhukar, A., Kapre, R., Rajkumar, K.C. Materials Research Society	12 Conference Proceedings Experiments in mask metrology using a CD AFM Klos,M.A., Yedur,S.K. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12