Toward a unified advanced CD-SEM specification for sub-0.18-ｦﾌm technology

Toward a unified advanced CD-SEM specification for sub-0.18-ｦﾌm technology

Author(s):

Allgair,J. ( Motorola )

Archie,C.N. ( IBM Corp. )

Banke,W. ( IBM Corp. )

Bogardus,H. ( SEMATECH )

Griffith,J.E. ( Lucent Technologies/Bell Labs. )

Marchman,H.M. ( Texas Instruments Inc. )

Postek,M.T. ( National Institute of Standards and Technology )

Saraf,L.H. ( SEMATECH )

Schlesinger,J.E. ( Texas Instruments Inc. )

Singh,B. ( Advanced Micro Devices,Inc. )

Sullivan,N.T. ( Digital Equipment Corp. )

Trimble,L.E. ( Lucent Technologies/Bell Labs. )

Vladar,A.E. ( Hewlett-Packard Co. )

Yanof,A.W. ( Motorola )

9 more

Publication title:

Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3332

Pub. Year:

1998

Page(from):

138

Page(to):

150

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427779 [0819427772]

Language:

English

Call no.:

P63600/3332

Type:

Conference Proceedings

Details

TDL ID:	ZA00018777
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology,Inspection, and Process Control for Microlithograph
Conf. info. (Number):	1998 : 12th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1998.02.23-1998.02.25

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