Ultralow-energy imaging for metrology
- Author(s):
- Joy,D.C. ( Univ.of Tennessee/Knoxville and Oak Ridge National Lab. )
- Publication title:
- Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3332
- Pub. Year:
- 1998
- Page(from):
- 42
- Page(to):
- 50
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427779 [0819427772]
- Language:
- English
- Call no.:
- P63600/3332
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Secondary-electron image profiles using bias voltage technique in deep contact hole
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Applications of image diagnostics to metrology quality assurance and process control
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Computer modeling of charging-induced electron beam deflection in electron beam lithography
SPIE - The International Society for Optical Engineering |