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Anisotropic etching of (111)-oriented silicon and applications

Author(s):
  • Chou,B.C.S. ( Precision Instrument Development Ctr. (Taiwan) )
  • Chen,C.-N. ( National Chiao Tung Univ.(Taiwan) )
  • Shie,J.-S. ( National Chiao Tung Univ.(Taiwan) )
  • Huang,W.-H. ( Precision Instrument Development Ctr. (Taiwan) )
  • Chen,C.-J. ( Precision Instrument Development Ctr. (Taiwan) )
Publication title:
Micromachining and microfabrication process technology IV : 21-22 September, 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3511
Pub. Year:
1998
Page(from):
337
Page(to):
341
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819429704 [0819429708]
Language:
English
Call no.:
P63600/3511
Type:
Conference Proceedings

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