Control and modeling of stress in multistacked polysilicon films considering oxidation effect
- Author(s):
Lee,C.S. ( Electronics and Telecommunications Research Institute (Korea) ) Jang,W.I. ( Electronics and Telecommunications Research Institute (Korea) ) Choi,C.A. ( Electronics and Telecommunications Research Institute (Korea) ) Hong,Y.S. ( Electronics and Telecommunications Research Institute (Korea) ) Lee,J.H. ( Electronics and Telecommunications Research Institute (Korea) ) No,K. ( Korea Advanced Institute of Science and Technology ) Wee,D.M. ( Korea Advanced Institute of Science and Technology ) - Publication title:
- Micromachining and microfabrication process technology IV : 21-22 September, 1998, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3511
- Pub. Year:
- 1998
- Page(from):
- 315
- Page(to):
- 324
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819429704 [0819429708]
- Language:
- English
- Call no.:
- P63600/3511
- Type:
- Conference Proceedings
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