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Silicon surface micromachining by anhydrous HF gas-phase etching with methanol

Author(s):
Jang,W.I. ( Electronics and Telecommunications Research Institute (Korea) )
Choi,C.A. ( Electronics and Telecommunications Research Institute (Korea) )
Lee,C.S. ( Electronics and Telecommunications Research Institute (Korea) )
Hong,Y.S. ( Electronics and Telecommunications Research Institute (Korea) )
Lee,J.H. ( Electronics and Telecommunications Research Institute (Korea) )
Baek,J.T. ( Electronics and Telecommunications Research Institute (Korea) )
Kim,B.W. ( Electronics and Telecommunications Research Institute (Korea) )
2 more
Publication title:
Micromachining and microfabrication process technology IV : 21-22 September, 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3511
Pub. date:
1998
Page(from):
143
Page(to):
150
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819429704 [0819429708]
Language:
English
Call no.:
P63600/3511
Type:
Conference Proceedings

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