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Improvements in Ultra-Thin Gate Oxide Thickness Metrology Using Rapid Optical Surface Treatment

Author(s):
Newcomb,R.
Kamieniencki,E.
Danel,A.
Tardif,F.
Kitagawara,K.
Mizuno,M.
Hirano,Y.
2 more
Publication title:
Analytical and diagnostic techniques for semiconductor materials, devices and processes : joint proceedings of the symposia on ALTECH 99, satellite symposium to ESSDERC 99, Leuven, Belgium [and] the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3895
Pub. Year:
1999
Page(from):
441
Page(to):
449
Pub. info.:
Pennington, N.J.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819434975 [0819434973]
Language:
English
Call no.:
P63600/3895
Type:
Conference Proceedings

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