Two-layer resist etchback planarization process coupled to chemical mechanical polishing for sub-0.18-ヲフm shallow trench isolation technology
- Author(s):
- Schiltz,A. ( France Telecom CNET-CNS )
- Palatini,L.
- Paoli,M.
- Rivoire,M.
- Prola,A.
- Publication title:
- Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3676
- Pub. Year:
- 1999
- Vol.:
- Part2
- Page(from):
- 802
- Page(to):
- 811
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431509 [0819431508]
- Language:
- English
- Call no.:
- P63600/3676
- Type:
- Conference Proceedings
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