Effects of mask roughness and condenser scattering in EUVL systems

Effects of mask roughness and condenser scattering in EUVL systems

Author(s):

Beaudry,N.A. ( Optical Sciences Ctr./Univ.of Arizona )
Milster,T.D.

Publication title:

Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3676

Pub. Year:

1999

Vol.:

Part2

Page(from):

653

Page(to):

662

Pub. info.:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819431509 [0819431508]

Language:

English

Call no.:

P63600/3676

Type:

Conference Proceedings

Details

TDL ID:	ZA00018541
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	1999 : 3rd
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1999.03.15-1999.03.17

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