Overlay error budgets for a high-throughput SCALPEL system
- Author(s):
- Stanton,S.T. ( Lucent Technologies/Bell Labs. )
- Farrow,R.C.
- Gallatin,C.M.
- Liddle,J.A.
- Waskiewicz,W.K.
- Publication title:
- Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3676
- Pub. Year:
- 1999
- Vol.:
- Part2
- Page(from):
- 543
- Page(to):
- 555
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431509 [0819431508]
- Language:
- English
- Call no.:
- P63600/3676
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
2
Conference Proceedings
Critical issues for developing a high-throughput SCALPEL system for sub-0.18-ヲフm lithography generations
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
9
Conference Proceedings
Design of a low-brightness highly uniform source for projection electron-beam lithography (SCALPEL)
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |