Simulation of resist heating using TEMPTATION software with different models of electron-beam energy deposition

Simulation of resist heating using TEMPTATION software with different models of electron-beam energy deposition

Author(s):: Kuzmin,I.Yu. ( Set-Service )
Publication title:: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 3676
Pub. Year:: 1999
Vol.:: Part2
Page(from):: 536
Page(to):: 542
Pub. info.:: Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819431509 [0819431508]
Language:: English
Call no.:: P63600/3676
Type:: Conference Proceedings

Details

TDL ID:	ZA00018541
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	1999 : 3rd
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1999.03.15-1999.03.17

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