Production of SCALPEL masks in a commercial mask facility
- Author(s):
Newport,C.L. ( DuPont Photomasks,Inc. ) Parker,J. Smith,K.M. Benveniste,A. Kim,N.-W. Reyland,D. Farrow,R.C. Novembre,A.E. Kasica,R.J. Knurek,C.S. Peabody,M.L. Rutberg,L. - Publication title:
- Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3676
- Pub. Year:
- 1999
- Vol.:
- Part1
- Page(from):
- 162
- Page(to):
- 170
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431509 [0819431508]
- Language:
- English
- Call no.:
- P63600/3676
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society for Optical Engineering |
7
Conference Proceedings
Defect inspection and linewidth measurement of SCALPEL thin membrane masks using optical transmission
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
9
Conference Proceedings
Cleaning of SCALPEL next-generation Lithography masks using PLASMAX,a revolutionary dry cleaning technology
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |