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Finite element modeling of SCALPEL masks

Author(s):
Engelstad,R.L. ( Univ.of Wisconsin/Madison )
Lovell,E.G.
Dicks,G.A.
Martin,C.J.
Schlax,M.P.
Semke,W.H.
Liddle,J.A.
Novembre,A.E.
3 more
Publication title:
Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3676
Pub. Year:
1999
Vol.:
Part1
Page(from):
128
Page(to):
139
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819431509 [0819431508]
Language:
English
Call no.:
P63600/3676
Type:
Conference Proceedings

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