UVN2-negative chemically amplified resist optimization for x-ray mask fabrication
- Author(s):
- Rocque,J.M. ( IBM Microelectronics Div. )
- Lercel,M.J.
- Brooks,C.J.
- Henry,R.W.
- Benoit,D.E.
- Publication title:
- Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3676
- Pub. Year:
- 1999
- Vol.:
- Part1
- Page(from):
- 46
- Page(to):
- 55
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431509 [0819431508]
- Language:
- English
- Call no.:
- P63600/3676
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
X-ray mask image-placement studies at the Microlithography Mask Development Center
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Advanced refractory-metal and process technology for the fabrication of x-ray masks
SPIE - The International Society for Optical Engineering |
8
Conference Proceedings
Chemically Amplified Resist Approaches for E-beam Lithography Mask Fabrication
Materials Research Society |
3
Conference Proceedings
Evaluation of an advanced chemically amplified resist for next-generation lithography mask fabrication
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Chemically amplified resists for electron-beam projection lithography mask fabrication
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
American Chemical Society |
6
Conference Proceedings
Characterization of oxynitride hard mask removal processes for refractory x-ray mask fabrication
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Next-generation lithography mask development at the NGL Mask Center of Competency
SPIE - The International Society for Optical Engineering |