Imaging capabilities of proximity x-ray lithography at 70-nm ground rules
- Author(s):
Krasnoperova,A.A. ( IBM Microelectronics Div. ) Rippstein,R.P. Flamholz,A.L. Kratschmer,E. Wind,S. Brooks,C.J. Lercel,M.J. - Publication title:
- Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3676
- Pub. Year:
- 1999
- Vol.:
- Part1
- Page(from):
- 24
- Page(to):
- 39
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431509 [0819431508]
- Language:
- English
- Call no.:
- P63600/3676
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Evaluation of the Defense Advanced Lithography Program(DALP)x-ray lithography aligner
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
UVN2-negative chemically amplified resist optimization for x-ray mask fabrication
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Advanced refractory-metal and process technology for the fabrication of x-ray masks
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Evaluation and comparison of the pattern transfer-induced image placement distortions on e-beam projection lithography masks
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
11
Conference Proceedings
Chemically amplified resists for electron-beam projection lithography mask fabrication
SPIE - The International Society for Optical Engineering |
6
Conference Proceedings
Next-generation lithography mask development at the NGL Mask Center of Competency
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
Mixed-proximity holographic mask technology for 50-nm VLSI by x-ray lithography
SPIE-The International Society for Optical Engineering |