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High-growth-rate epitaxy of InN film by a novel-design MOCVD

Author(s):
Yang,F.-H. ( National Taiwan Univ. )
Yang,Y.-J.
Hwang,J.-H.
Lee,C.-H.
Chen,K.-H.
Lin,C.-Y.
1 more
Publication title:
Optoelectronic Materials and Devices II
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4078
Pub. Year:
2000
Page(from):
500
Page(to):
506
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819437174 [0819437174]
Language:
English
Call no.:
P63600/4078
Type:
Conference Proceedings

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