Blank Cover Image

Specular spectral profilometry on metal layers

Author(s):
Publication title:
Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3998
Pub. Year:
2000
Page(from):
882
Page(to):
892
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436160 [081943616X]
Language:
English
Call no.:
P63600/3998
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Phase profilometry for the 193-nm lithography gate stack

Jakatdar,N.H., Niu,X., Bao,J., Spanos,C.J., Yedur,S.K., Deleporte,A.G.

SPIE - The International Society for Optical Engineering
7 Conference Proceedings Neural network approach to rapid thin film characterization

Jakatdar,N., Niu,X., Spanos,C.J.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Optical thin-film decomposition for DUV positive-tone resist process monitoring

Niu,X., Jakatdar,N.H., Spanos,C.J., Bendik,J.J., Kovacs,R.P.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Specular spectroscopic scatterometry in DUV lithography

Xinhui Niu, Nickhil H. Jakatdar, Junwei Bao, Costas J. Spanos, Sanjay K. Yedur

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Characterization of a positive chemically amplified photoresist for process control

Jakatdar,N.H., Niu,X., Spanos,C.J., Romano,A.R., Bendik,J.J., Kovacs,R.P., Hill,S.L.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings In-situ metrology for deep-ultraviolet lithography process control

Jakatdar,N.H., Niu,X., Musacchio,J.T., Spanos,C.J.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Novel DUV photoresist modeling by optical thin film decomposition from spectral ellipsometry/reflectometry data

Niu,X., Jakatdar,N., Spanos,C.J.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Parameter extraction framework for DUV lithography simulation

Nickhil H. Jakatdar, Junwei Bao, Costas J. Spanos, Xinhui Niu, Joseph J. Bendik

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Characterization of a chemically amplified photoresist for simulation using a modified"poor man's DRM" methodology

Jakatdar,N.H., Niu,X., Spanos,C.J.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Optical digital profilometry applications on contact holes

Bischoff, J., Niu, X., Jakatdar, N.H.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Deep-ultraviolet lithography simulator tuning by resist profile matching

Niu,X., Jakatdar,N.H., Spanos,C.J.

SPIE - The International Society for Optical Engineering
12 Conference Proceedings Specular spectroscopic profilometry for the sub-0.18ｦﾌm polySi-gate processes

Niu,X., Jakatdar,N.H., Yedur,S.K., Singh,B.

SPIE - The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12