Implementation of automated macro after develop inspection in a production lithography process

Implementation of automated macro after develop inspection in a production lithography process

Author(s):

Yanof,A.W. ( Motorola )

Publication title:

Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3998

Pub. Year:

2000

Page(from):

504

Page(to):

514

Pub. info.:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436160 [081943616X]

Language:

English

Call no.:

P63600/3998

Type:

Conference Proceedings

Details

TDL ID:	ZA00018514
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, inspection, and process control for microlithography
Conf. info. (Number):	2000 : 14th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2000.02.28-2000.03.02

Similar Items:

1 Conference Proceedings Maximizing common process latitude by integtrated process development for 130-nm lithography Reilly, M.T., Parker, C.R., Fischer, F.W., Hiar, T. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Optimization of an integrated and automated macro inspection system for the utilization of wafer color variation detection in a photolithography cluster … Lickteig, S. J., Forstner, T. W., Barnett, A. R., Dixon, D. S., Menon, V. C., Isaacson, R. L., Nicholls, M. C., Liu, Y., … SPIE - The International Society of Optical Engineering
2 Conference Proceedings Advanced technology for after-develop inspection Z. Y. Chen, I. C. Chou, J. H. Yang, W. Chen, J. Chang Society of Photo-optical Instrumentation Engineers	8 Conference Proceedings Visual inspection reliability of transport aircraft Spencer,F.W. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Benchmarking of advanced CD-SEMs against a new unified specification for sub-0.18-μm lithography Deleporte,A.G., Allgair,J., Archie,C.N., Banke,G.W., Postek,M.T., Schlesinger,J.E., Vladar,A.E., Yanof,A.W. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Fully automated interference lithography MacLeod, B.D., Kelsey, A.F., Leclerc, M.A., Resler, D.P., Liberman, S., Nole, J.P. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Benchmarking of advanced CD-SEMs against the new unified specification for sub-0.18-ｦﾌm lithography Deleporte,A.G., Allgair,J., Archie,C.N., Banke,G.W., Postek,M.T., Schlesinger,J.E., Vladar,A.E., Yanof,A.W. SPIE - The International Society for Optical Engineering	10 Conference Proceedings Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec (M5k) DUV tool Scheuring, G., Petrashenko, A., Doebereiner, S., Hillmann, F., Brucek, H.-J., Hourd, A.C., Grimshaw, A., Hughes, G., … SPIE-The International Society for Optical Engineering
5 Conference Proceedings Application of critical shape metrology to 90nm process Hannon, S., Kennemer, H., Robinson, J. C., Cusacovich, M., Nelson, C. SPIE - The International Society of Optical Engineering	11 Conference Proceedings An integrated approach to the determination of a manufacturable process window in advanced microlithography [6152-118] Cusacovich, M., Robinson, J. C., Cheng, S., Storms, G, Leray, P., Lorusso, G. F. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Analysis of errors in dimensional inspection based on active vision C.C. Yang, M.M. Marefat, F.W. Ciarallo Society of Photo-optical Instrumentation Engineers	12 Conference Proceedings Contrast sensitivity methods for acceptable limits of visual defects in CMOS sensors Yanof, A.W., Jachimowicz, K.E. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12