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Subwavelength alignment mark signal analysis of advanced memory products

Author(s):
Yin,X. ( IBM Microelectronics Div. )
Wong,A.K.
Wheeler,D.C.
Williams,G.
Lehner,E.A.
Zach,F.X.
Kim,B.Y.
Fukuzaki,Y.
Lu,Z.G.
Credendino,S.
Wiltshire,T.J.
6 more
Publication title:
Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3998
Pub. Year:
2000
Page(from):
449
Page(to):
459
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436160 [081943616X]
Language:
English
Call no.:
P63600/3998
Type:
Conference Proceedings

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