Blank Cover Image

Experiments in mask metrology using a CD AFM

Author(s):
Publication title:
Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3998
Pub. Year:
2000
Page(from):
350
Page(to):
361
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436160 [081943616X]
Language:
English
Call no.:
P63600/3998
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings CD metrology of binary and phase shift masks using scatterometry [5992-55]

Lee, K. M., Yedur, S., Tabet, M., Tavassoli, M.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Scatterometry measurement of nested lines, dual space, and rectangular contact CD on phase-shift masks

K. M. Lee, S. Yedur, S. Henrichs, M. Tavassoli, K. Baik

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Scatterometry based CD and profile metrology of chrome-less masks using optical digital profilometry [6283-111]

Lee, K., Yedur, S., Cheng, W., Tovassoli, M., Baik, K.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Evaluation of atomic force microscopy: comparison with electrical CD metrology and low-voltage scanning electron microscopy

Sanjay K. Yedur, Bhanwar Singh

SPIE - The International Society of Optical Engineering
3 Conference Proceedings CD and profile metrology of embedded phase shift masks using scatterometry [6281-46]

Lee, M. K., Yedur, S., Hetzer, D., Tavassoli, M., Baik, K.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Scatterometry based CD and profile metrology of MoSi/ quartz structures [5992-153]

Yedur, S., Vuong, V., Shivaprasad, D., Sarathy, T. P., Tabet, M., Korlahalli, R., Hu, J.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Contact hole CD and profile metrology of binary and phase-shift masks: effect of modeling strategies in application of scafferometery [6349-22]

Lee, K., Yedur, S., Tavassoli, M., Baik, K., Tabet, M.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Mask CD control (CDC) using AIMS as the CD metrology data source

G. Ben-Zvi, E. Zait, V. Dmitriev, S. Labovitz, E. Graitzer

Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings CD and profile metrology of EUV masks using scatterometry based optical digital profilometry [6349-92]

Cho, S., Yedur, S., Kwon, M., Tabet, M.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec (M5k) DUV tool

Scheuring, G., Petrashenko, A., Doebereiner, S., Hillmann, F., Brucek, H.-J., Hourd, A.C., Grimshaw, A., Hughes, G., …

SPIE-The International Society for Optical Engineering
6 Conference Proceedings CD-etch depth measurement from advanced phase-shift masks and wafers using optical scatterometry [6152-63]

Lee, K. M., Yedur, S., Henrichs, S., Tavassoli, M.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings High-precision mask repair using nanomachining

Verbeek, M., White, R., Klos, M.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12