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Influence of intermetal dielectric thickness on overlay mark size variation in photolithography

Author(s):
Lee,S.-J. ( Samsung Electronics Co.,Ltd. )
Yoo,J.-Y.
Kim,Y.-C.
Kim,H.
Nam,J.-L.
Chung,U.-I.
Kang,G.-W.
Han,W.-S.
3 more
Publication title:
Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3998
Pub. date:
2000
Page(from):
195
Page(to):
204
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436160 [081943616X]
Language:
English
Call no.:
P63600/3998
Type:
Conference Proceedings

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