New process monitor for reticles and wafers:the MEEF meter
- Author(s):
- Schellenberg,F.M. ( Mentor Graphics )
- LaCour,P.
- Toublan,O.
- Anderson,G.
- Yip,R.
- Publication title:
- Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3998
- Pub. Year:
- 2000
- Page(from):
- 187
- Page(to):
- 194
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436160 [081943616X]
- Language:
- English
- Call no.:
- P63600/3998
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society for Optical Engineering |
7
Conference Proceedings
Adoption costs and hierarchy efficiency for 100 nm and beyond (Invited Paper)
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Design strategies for future lithography technologies (or: OPC will never die)
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Resolution enhancement technology: the past, the present, and extensions for the future
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
Inspection of integrated circuit database through reticle and wafer simulation: the lithography process window performance monitoring [5992-141]
SPIE - The International Society of Optical Engineering |