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Phase profilometry for the 193-nm lithography gate stack

Author(s):
Jakatdar,N.H. ( Timbre Technology,Inc. )
Niu,X.
Bao,J.
Spanos,C.J.
Yedur,S.K.
Deleporte,A.G.
1 more
Publication title:
Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3998
Pub. Year:
2000
Page(from):
116
Page(to):
124
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436160 [081943616X]
Language:
English
Call no.:
P63600/3998
Type:
Conference Proceedings

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