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193-nm scanner characterization by SEM and electrical CD measurements

Author(s):
Pain,L. ( CEA-LETI )
Trouiller,Y.
Barberet,A.
Guirimand,O.
Fanget,G.L.
Martin,N.
Quere,Y.
Nier,M.E.
Lajoinie,E.
Louis,D.
Heitzmann,M.
Scheiblin,P.
Toffoli,A.
8 more
Publication title:
Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3998
Pub. Year:
2000
Page(from):
96
Page(to):
107
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436160 [081943616X]
Language:
English
Call no.:
P63600/3998
Type:
Conference Proceedings

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