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Linewidth measurement intercomparison on a BESOI sample

Author(s):
Villarrubia,J.S. ( National Institute of Standards and Technology )
Vladar,A.E.
Lowney,J.R.
Postek,M.T.
Allen,R.A.
Cresswell,M.W.
Ghoshtagore,R.N.
2 more
Publication title:
Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3998
Pub. date:
2000
Page(from):
84
Page(to):
95
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436160 [081943616X]
Language:
English
Call no.:
P63600/3998
Type:
Conference Proceedings

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