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Comparison of electrical CD measurements and cross-section lattice-plane counts of submicrometer features replicated in(100)silicon-on-insulator material

Author(s):
Cresswell,M.W. ( National Institute of Standards and Technology )
Bonevich,J.E.
Headley,T.J.
Allen,R.A.
Giannuzzi,L.A.
Everist,S.C.
Ghoshtagore,R.N.
Shea,P.J.
3 more
Publication title:
Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3998
Pub. date:
2000
Page(from):
74
Page(to):
83
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436160 [081943616X]
Language:
English
Call no.:
P63600/3998
Type:
Conference Proceedings

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