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*Atomic layer deposition of thin films using sequential surface reactions

Author(s):
Publication title:
New methods, mechanisms and models of vapor deposition : symposium held April 24-26, 2000, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
616
Pub. Year:
2000
Page(from):
93
Pub. info.:
Warrendale, PA: MRS-Materials Research Society
ISSN:
02729172
ISBN:
9781558995246 [1558995242]
Language:
English
Call no.:
M23500/616
Type:
Conference Proceedings

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