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IN-SITU STRESS CONTROL DURING SPUTTER DEPOSITION

Author(s):
Publication title:
Materials aspects of x-ray lithography : symposium held April 12-14, 1993, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
306
Pub. Year:
1993
Page(from):
275
Pub. info.:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992023 [1558992022]
Language:
English
Call no.:
M23500/306
Type:
Conference Proceedings

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