Blank Cover Image

Intense UV-Visible-IR Adjustable Photoluminescence From Silicon-Rich Oxynitride Layers Prepared by Plasma-Enhanced Chemical Vapor Deposition

Author(s):
Publication title:
Luminescent materials : symposium held April 5-8, 1999, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
560
Pub. Year:
1999
Page(from):
113
Pub. info.:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994676 [155899467X]
Language:
English
Call no.:
M23500/560
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings The Strong Blue-Shifted Photoluminescence from Amorphous Silicon- Nitride (a-SiNx,:H)Layers prepared by PECVD method

Pei, Z., Chang, Y.R., Hsiao, H.L., Hwang, H.L.

Electrochemical Society
7 Conference Proceedings Visible photoluminescence from F-doped nanocrystallites of silicon films prepared by laser chemical vapor deposition

Dar'yushkin,A.E., Korovin,S.B., Pustovoy,V.I.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Plasma-enhanced chemical vapor deposition of nitrogen-rich silicon oxynitride thin film for gate insulator application

W.-J. Qi, W.-F. Yu, B.-Z. Li, J. Liu, F. Lu

Society of Photo-optical Instrumentation Engineers
8 Conference Proceedings Field Emission Properties of Nanocrystalline and Amorphous Silicon Carbon Nitride Prepared from Microwave Plasma Chemical Vapor Deposition

Cheng, W. J., Jiang, J. C., Zhang, Y., Shen, D. Z., Zhu, H. S.

Trans Tech Publications
3 Conference Proceedings White photoluminescence from SiNx films prepared by plasma enhanced chemical vapor deposition [6337-31]

Kang, Z. T., Wagner, B. K., Parrish, J., Summers, C. J.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF SILICON NITRIDE FROM NOVEL ORGANOSILANES

Grow, J. M., Levy, R. A., Yu, Y., Shih, K. T.

MRS - Materials Research Society
4 Conference Proceedings Effect of growth parameters on refractive index and film composition of plasma enhanced chemical vapor deposition silicon oxynitride films

Naskar, S., Bower, C. A., Yadon, L. N., Wolter, S. D., Stoner, B. R., Glass, J. T.

Materials Research Society
10 Conference Proceedings WELL-RESOLVED BAND-EDGE PHOTOLUMINESCENCE FROM STRAINED Si1-xGex LAYERS GROWN BY RAPID THERMAL CHEMICAL VAPOR DEPOSITION

Sturm, J.C., Schwartz, P.V., Manoharan, H., Mi, Q., Lenchyshyn, L.C., Thewalt, M.L.W., Rowell. N.L., Noel, J.-P., …

Materials Research Society
5 Conference Proceedings Electrical and Mechanical Properties of Nitrogen and Fluorine Incorporated Organosilicate Glass Prepared by Plasma Enhanced Chemical Vapor Deposition

JangJian, S-K., Liu, C-P., Hwang, W-S., Chen, S-W., Wei, K-H., Wang, Y-L.

Electrochemical Society
11 Conference Proceedings Polymorphous Silicon Nanowires Synthesized by Plasma-Enhanced Chemical Vapor Deposition

Zeng, X.B., Liao, X.B., Diao, H.W., Hu, Z.H., Xu, Y.Y., Zhang, S.B., Chen, C.Y., Chen, W.D., Kong, G.L.

Materials Research Society
6 Conference Proceedings AMORPHOUS HYDROGENATED SILICON CARBIDE PREPARED FROM DC-BIASED RF-PLASMA-ENHANCED CHEMICAL VAPOR DEPOSiTION

Lu, H.Y., Petrich, M.A.

Materials Research Society
12 Conference Proceedings High-quality silicon nitride films prepared by low-frequency plasma-enhanced chemical vapor deposition

H. Zhang, X. Xu, Y. Leng, W. Li, Z. Wu

Society of Photo-optical Instrumentation Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12