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Evidence of Interdiffusion Effect in Stacked Polycrystalline SiGe/Si Layers for CMOS Gate Application

Author(s):
Hernandez, C.
Campidelli, Y.
Sagnes, I.
Henrisey, E.
Martin, F.
Bensahel, D.
1 more
Publication title:
Epitaxy and applications of si-based heterostructures : symposium held April 13-17, 1998, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
533
Pub. Year:
1998
Page(from):
93
Pub. info.:
Warrendale, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994393 [1558994394]
Language:
English
Call no.:
M23500/533
Type:
Conference Proceedings

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