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Electron Microscopic Studies of Co- and Ti-Germanosilicide Films Formed on SiGe Layers

Author(s):
Publication title:
Electron microscopy of semiconducting materials and ULSI devices : symposium held Aprl 15-16, 1998, San Francisco, California, U. S. A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
523
Pub. Year:
1998
Page(from):
133
Pub. info.:
Warrendale, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994294 [1558994297]
Language:
English
Call no.:
M23500/523
Type:
Conference Proceedings

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