High-Rate ECR Plasma Etching of Cu at Room Temperature in Cl2/Ar

High-Rate ECR Plasma Etching of Cu at Room Temperature in Cl2/Ar

Author(s):

Jung, K-B.

Publication title:

Structure and evolution of surfaces : symposium held December 2-5, 1996, Boston, Massachusette, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

440

Pub. Year:

1997

Page(from):

449

Pub. info.:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993440 [1558993444]

Language:

English

Call no.:

M23500/440

Type:

Conference Proceedings

Details

TDL ID:	ZA00018450
Series ID:	PA00000011
Conf. info. (Name):	Symposium on structure and evolution of surfaces
Conf. info. (Number):	1996
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1996.12.02-1996.12.05

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