
FIB repair of opaque defects for 64-Mb-DRAM-level binary masks
- Author(s):
Lee,K.H. ( Samsung Electronics Co.Ltd. ) Cho,H.K. Park,J.H. Kim,Y.H. Yoon,H.S. Sohn,J.M. - Publication title:
- 16th Annual BACUS Symposium on Photomask Technology and Management
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2884
- Pub. Year:
- 1996
- Page(from):
- 442
- Page(to):
- 453
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819422828 [0819422827]
- Language:
- English
- Call no.:
- P63600/2884
- Type:
- Conference Proceedings
Similar Items:
1
![]() SPIE-The International Society for Optical Engineering |
7
![]() SPIE - The International Society of Optical Engineering |
2
![]() SPIE-The International Society for Optical Engineering |
Electrochemical Society |
3
![]() SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
![]() SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
![]() SPIE-The International Society for Optical Engineering |
6
![]() Trans Tech Publications |
12
![]() SPIE - The International Society of Optical Engineering |