FIB repair of opaque defects for 64-Mb-DRAM-level binary masks

FIB repair of opaque defects for 64-Mb-DRAM-level binary masks

Author(s):

Lee,K.H. ( Samsung Electronics Co.Ltd. )

Publication title:

16th Annual BACUS Symposium on Photomask Technology and Management

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2884

Pub. Year:

1996

Page(from):

442

Page(to):

453

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819422828 [0819422827]

Language:

English

Call no.:

P63600/2884

Type:

Conference Proceedings

Details

TDL ID:	ZA00018423
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual Symposium on Photomask Technology and Management
Conf. info. (Number):	1996 : 16th
Conf. info. (Venue):	Redwood City, California, USA
Conf. info. (Date):	1996.09.18-1996.09.20

Similar Items:

1 Conference Proceedings Detectability and printability of programmed defects in the contact layer for 256-Mb-DRAM grade reticle Kim,Y.H., Park,J.H., Lee,K.H., Cho,H.K., Yoon,H.S. SPIE-The International Society for Optical Engineering	7 Conference Proceedings The study to enhance the accuracy of FIB repair on mask pattern of DRAM [6152-94] Choi, Y., Kim, H., Kim, S., Han, O. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Parameters affecting megasonic power transmittance in the megasonic cleaning process Kim,Y.H., Park,J.H., Lee,K.H., Choi,S.W., Yoon,H.S., Sohn,J.M. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Effect of crystal defects on device characteristics Park, J.G., Park, J.M., Cho, K.C., Lee, G.S., Chung, H.K. Electrochemical Society
3 Conference Proceedings Detectability and printability of programmed defect reticle for 256-Mb dram Park,J.H., Cho,H.-K., Kim,Y.-H., Lee,K.-H., Yoon,H.-S. SPIE-The International Society for Optical Engineering	9 Conference Proceedings ArF issues of 90-nm-node DRAM device integration Goo, D.-H., Kim, B.-S., Park, J.-S., Yoon, K.-S., Lee, J.-H., Cho, H.-K., Han, W.-S., Moon, J.-T. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Mask technology for 0.18-ｦﾌm device generation Sohn,J.M., Choi,S.W., Kim,B.G., Cho,H.K., Yoon,H.S. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes Choi, Y.-H., Park, J.R., Sung, M.-G., Yang, S.-H., Kim, S.-H., Lee, H.-J., Lee, J.-Y., Jang, I.Y., Kim, Y.H., Choi, … SPIE-The International Society for Optical Engineering
5 Conference Proceedings Performance of gas-assisted FIB repair for opaque defects Satoh,Y., Nakamura,H., Fujikawa,J., Tsuchiya,K., Noguchi,S., Aita,K., Yasaka,A. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Chemically enhanced FIB repair of opaque defects on molybdenum silicide photomasks Casey,J.D.,Jr., Doyle,A.F., Stewart,D.K., Ferranti,D.C., Raphaelian,M.L., Morgan,J.C. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Characterization Analysis According to Growth Temperature of Carbon Nanowall on Metal Coated Substrate for Electrode Application of Energy Storage J.K. Park, W.S. Choi, H.S. Hwang, K.H. Lee, J.H. Kim, Y.H. Joung Trans Tech Publications	12 Conference Proceedings Simulation and experiments for inspection properties of EUV mask defects [6283-85] Park, J., Kim, -S. S., Lee, S., Woo, -G. S., Cho, -K. H., Moon, -T. J. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12