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4。゚reticles with 3% linewidth control for the development of 0.18-ヲフm lithography

Author(s):
Publication title:
16th Annual BACUS Symposium on Photomask Technology and Management
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2884
Pub. date:
1996
Page(from):
290
Page(to):
301
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819422828 [0819422827]
Language:
English
Call no.:
P63600/2884
Type:
Conference Proceedings

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