Materials screening for attenuating embedded phase-shift photoblanks for DUV and 193-nm photolithography
- Author(s):
- Carcia,P.F. ( DuPont Co.Central Research )
- French,R.H.
- Sharp,K.G.
- Meth,J.S.
- Smith,B.W.
- Publication title:
- 16th Annual BACUS Symposium on Photomask Technology and Management
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2884
- Pub. Year:
- 1996
- Page(from):
- 255
- Page(to):
- 263
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819422828 [0819422827]
- Language:
- English
- Call no.:
- P63600/2884
- Type:
- Conference Proceedings
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