Chemically amplified resist process for 0.25-ヲフm-generation photomasks
- Author(s):
- Katsumata,M. ( Sony Corp. )
- Kawahira,H.
- Sugawara,M.
- Nozawa,S.
- Publication title:
- 16th Annual BACUS Symposium on Photomask Technology and Management
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2884
- Pub. Year:
- 1996
- Page(from):
- 83
- Page(to):
- 91
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819422828 [0819422827]
- Language:
- English
- Call no.:
- P63600/2884
- Type:
- Conference Proceedings
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