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Chemically amplified resist process for 0.25-ｦﾌm-generation photomasks

Author(s):
Publication title:
16th Annual BACUS Symposium on Photomask Technology and Management
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2884
Pub. Year:
1996
Page(from):
83
Page(to):
91
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819422828 [0819422827]
Language:
English
Call no.:
P63600/2884
Type:
Conference Proceedings

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