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Statistical metrology:understanding spatial variation in semiconductor manufacturing

Author(s):
Publication title:
Microelectronic Manufacturing Yield, Reliability, and Failure Analysis II
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2874
Pub. Year:
1996
Page(from):
16
Page(to):
26
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819422729 [081942272X]
Language:
English
Call no.:
P63600/2874
Type:
Conference Proceedings

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