Nonspecular scattering from multilayer mirrors at normal incidence
- Author(s):
- Gullikson,E.M. ( Lawrence Berkeley National Lab. )
- Stearns,D.G. ( Lawrence Livermore National Lab. )
- Gaines,D.P. ( Lawrence Livermore National Lab. )
- Underwood,J.H. ( Lawrence Berkeley National Lab. )
- Publication title:
- Grazing incidence and multilayer X-ray optical systems : 27-29 July 1997, San Diego, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3113
- Pub. Year:
- 1997
- Page(from):
- 412
- Page(to):
- 419
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819425355 [0819425354]
- Language:
- English
- Call no.:
- P63600/3113
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society for Optical Engineering |
7
Conference Proceedings
Multilayer coating and tests of a 10。゚ extreme-ultraviolet lithographic camera
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
8
Conference Proceedings
Beamline for metrology of x-ray/EUV optics at the Advances Light Source (Invited Paper)
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Beamline for measurement and characterization of multilayer optics for EUV lithography
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
5
Conference Proceedings
Elastic bending and water cooling strategies for producing high-quality synchrotron radiation mirrors in silicon (Invited Paper)
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
6
Conference Proceedings
High-precision reflectometry of multilayer coatings for extreme ultraviolet lithography
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
High flux undulator beamline optics for EUV interferometry and photoemission microscopy
SPIE-The International Society for Optical Engineering |